ETA Helios INLINE-tn

Coating Measurement of Solar Cells; Thickness and Refractive Index of Silicon Nitride

For wafer based solar cells the anti-reflective coating, surface passivation and diffusion barrier play an important role to achieve high solar cell efficiency and long-term stability. Because of its excellent characteristics Silicon Nitride coating (a-SiNx:H) is widely used for this purpose.

Process parameters such as the gas pressure and temperature of the cell during deposition have a strong influence on the layer thickness and optical constants n&k of Silicon Nitride. Therefore, it is essential to gain detailed knowledge of the layer thickness and the optical constants n&k during the process.
Conventional measurement technology can only measure Silicon Nitride layer properties offline and on polished wafers.

Measurement of Silicon Nitride

AudioDev offers unique equipment to measure the layer thickness as well as refractive index of the Silicon Nitride layer. The system is designed and optimized for inline use and can be retrofitted in existing production lines..

Measurement Example

Measurement of thickness and refractive index of
Silicon Nitride

  Download the ETA INLINE-tn product sheet